Name: Skyspring Nanomaterials上海代理
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Skyspring Nanomaterials上海代理

產(chǎn)品特點:
Skysprin上海代理
：
SkySpring Nanomaterials是一家通過ISO 9001認證的納米顆粒，納米粉末，微米粉末和CNT（碳納米管）的小批量供應(yīng)商，供研究和批量訂購。

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產(chǎn)品介紹

創(chuàng)亞化工（上海）有限公司是一家致力于生命科學(xué)和生物技術(shù)領(lǐng)域的高科技企業(yè)。公司由在國內(nèi)科研試劑領(lǐng)域有著十幾年從業(yè)經(jīng)驗的專業(yè)技術(shù)團隊和企業(yè)管理團隊組建而成，專門從事以抗體、細胞因子、免疫檢測試劑盒等免疫學(xué)產(chǎn)品為主的生物試劑的研發(fā)與銷售。

Skyspring Nanomaterials上海代理*Beckman A63881的磁珠現(xiàn)貨，moltox 11-101.5等現(xiàn)貨，transgenomic 706020/706025現(xiàn)貨，Megazyme的大部分現(xiàn)貨，LIST現(xiàn)貨，、ALZET大量現(xiàn)貨，

Skyspring Nanomaterials上海代理Avanti 、tedpella 、BioLegend、Polyplus、jena bioscience、Mattek、MRC-Holland、polysciences、enzo、novus、TOCRIS、CAYMAN、Neuro Probe、cyguns、eylabs、NIBSC、chondrex、lc laboratories、BTI、etonbio

Skyspring Nanomaterials上海代理

：楊旖

：15021505715 021-61525262

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Skyspring Nanomaterials上海代理

0115CY Ag, 99.95%, 100nm

0118XH Ag, 99.95%, 20-30nm

0120XH Ag, 99.95%, 20-30nm, PVP coated

0121XH Ag, 99.9%, 50-60nm

0123NJ Ag, 99.99%, 30-50nm, oleic acid coated

0124DX Ag, 99.9%, 200-400nm

0125DX Ag, 99.9%, 500-800 nm

0127SH Ag, 99.99%, 15nm, 25wt%, self-dispersible

0129HN Ag, nanowires

0200SJ Al, 99.9%, 18nm

0220XH Al, 99.7%, 40-60nm

0221XH Al, 99.7%, 60-80nm

0226XH Al, 99.7%, 100~130nm

0230HJ Al, 98%, 1~2um

0231NG Al, 99%, 1um, Spherical

0232NG Al, 99%, 2um, Spherical

0233NG Al, 99%, 5um, Spherical

0271DX Al-Si, 1~2um

0272DX Al-Si, 4~5um

0310DX Au, 99.99%, 50-100nm

0311DX Au, 99.9%, 20nm

0400BZ B, 99.9999%

0401BZ B, 99.999%

0402BZ B, 99.99%

0403BZ B, 99.9%

0410DX B, 99.9%, <100nm

0470DX Bi, 99.9%, <100nm

0480DX Bi, 99.0+%, -325 mesh

0490DX Bi, 99%, <25um

0510HZ Diamond, 95%, 3-4nm

0511HZ Diamond, 93%, 3-4nm

0512HZ Diamond, 55-75 %, 4-15nm

0520BX Graphite, 93%, 3-4nm

0522DX Graphite, 95%, <100nm

0521QZ Graphite, natural flake, 99%, 1um

0540DX Graphene Nanopowder (1-5 nm)

0541DX Graphene Nanopowder (6-8 nm)

0544DX Graphene Nanopowder (11-15 nm)

0530HT Super Activated Carbon, 100nm

0539DX Carbon Powder,99.99%

0610SJ Co, 99.8%, 25-30nm

0617SJ Co, C coated, 25~30nm

0721XH Cr, 99.7%, 60-80nm

0731DX Cr, 99.5%, ~5um

0851HN Cu, 5-7nm, dispersion, oil soluble

0800SJ Cu, 99.8%, 25nm

0820XH Cu, 99.9%, 40-60nm

0821XH Cu, 99.9%, 60-80nm

0824XH Cu, 99.9%, 100~130nm

0811DX Cu, 99.5%, 300nm

0810DX Cu, 99.8%, 500nm

0809NG Cu, 99.8%, 1um

0881NW Cu nanowires, 150nm immersed in ethanol

0882NW Cu nanowires, 300nm

0883NW Cu nanowires, 300nm immersed in ethanol

0915SJ Fe, 99.9%, 25nm

0922XH Fe, 99.7+%, 40-60nm

0923XH Fe, 99.7+%, 60-80nm

0924XH Fe, 99.7+%, 100~130nm

0961XH Stainless Steel 316L, 60-80nm

0990JH Carbonyl-Fe, micro-sized

3606DX Ge, 99.8+%, <200 nm

9120XH Mo, 99.7%, 40-60nm

9121XH Mo, 99.7%, 60-80nm

9130CN Mo, 99.9%, 0.5-0.8um

9213SG Ni, 99.9%, 1.0-1.5um

9225SJ Ni, 99.9%, 20nm

9227SJ Ni coated with carbon, 99.9%, 20nm

9220XH Ni, 99.7%, 40-60nm

9221XH Ni, 99.7%, 60-80nm

9210NG Ni, 99.9%, 500nm

9211NG Ni, 99.9%, 180nm

9215XH Ni, 99.8%, 80~150nm

9216NG Ni, 99.9%, 300nm

9230DX Ni, 99.9%, -325mesh

9290JH Carbonyl-Ni, 2-3um

9291DX Carbonyl-Ni, 4-7um

9293JH Carbonyl-Ni-Al (Ni Shell, Al Core)

9295JH Carbonyl-Ni-Fe Alloy

9410DX Pt, 99.9%, 200nm

9712HK Si, 99%, 100nm

9715DX Si, 99.9%, 500nm

9717HK Si, 99%, 30nm

9717DX Si, 99%, 50nm

9718DX Si, 99.999%, -325mesh

9719DX Si, 99.9+%, -200/+325 mesh

9720DG Si, Polycrystalline, 99.99995%, lumps

1021XH Sn, 99.7%, <100nm

1110XH Ta, 99.7%, 60-80nm

1123XH Ti, 99.9%, 40-60nm

1124XH Ti, 99.9%, 60-80nm

1126XH Ti, 99.9%, 40~60nm, PVP coated

1131DX Ti, 99.5%, ~6um

9820XH W, 99.7%, 40-60nm

9821XH W, 99.7%, 80-100nm

9920XH Zn, 99.7%, 40-60nm

9921XH Zn, 99.7%, 80-100nm

9990DX Zn, 99.9%, -325mesh

1315TB AlOOH, 10-20nm, 99.99%

1319NH Al₂O₃alpha, 99.0%, 40nm

1318DL Al₂O₃ alpha, 99.999%, 0.5-10um

1317NH Al₂O₃ alpha, 99.0%, 150nm

1320DL Al₂O₃ alpha, 99.9%, 50nm

1329DX Al₂O₃ alpha, 99.85%, 90~150nm

1321DL Al₂O₃ alpha, 99.99%, 0.3-0.8um

1324DL Al₂O₃ alpha, 99.99%, 3.5-15um

1328QI Al₂O₃ gamma, 99.9%, 5nm

1330DL Al₂O₃ gamma, 99.9%, 20nm

1331DL Al₂O₃ gamma, 99.9%, 0.4-1.5um

1338GJ Al2O3 Alpha, 99.999%, 5~8um

1340DL Al₂O₃, alpha, 99%, <100nm, hydrophobic coating

1340DX Aluminum Zinc Oxide Micropowder

1341DL Al(OH)₃, 99.99%, 30-100nm

1342DL Al(OH)₃, 99.99%, 2-10um

1360HK AlN, 99%, 40nm

1366HM Al(NO3)3, -325mesh

1401GC BaTiO₃, 99.9%, 100nm

1520DX B₂O₃, 99.5%, 80nm

1531DX B2O3, 98%, - 200mesh

1522DX BN, 99.5+%, 100nm

1526BZ BN, 99.99%, 3-4um

1527BZ BN, 99.9%, 3-4um

1540HK B4C, 99+%, 50nm

1710CY Bi₂O₃, 99.9%, <200nm

1712DX Bi2O3, 99.9%, 5~20um

1950RH CaCO₃, 97.5%, 15-40nm, paste

1951RH CaCO₃, 97.5%, 15-40nm

1952RH CaCO₃, 15-40nm, surface modified for water-based latex paint

1953RH CaCO₃, 15-40nm, surface modified for plastic, PE/PP

1954RH CaCO₃, 15-40nm, surface modified for plastic, PVC

1955RH CaCO₃, 15-40nm, surface modified for printing inks

1956RH CaCO₃, 15-40nm, surface modified for rubber

1957RH CaCO₃, 15-40nm, surface modified for adhesives

1970NE Ca₁₀(PO₄)₆(OH)₂, 98.5%, 40nm

2110CG CeO₂, 99.9%, 10-30nm

2113CG CeO₂, 99.9%, 0.1-1.0um

2115DX CeO₂, 99.9%, 1.0~3.0um

2118CG CeO₂, 99.9%, ~5um

2161DX CeO₂ doped with 10mol% Gd₂O₃, <100nm
2196DX CeF₃, 99.9%

2310SC CoO, <100nm

2320SC Co₂O₃, <100nm

2330SC Co₃O₄, 50nm

2510DX CsNO₃, 99.9%

2511DX CsOH, 99.9%

2512DX CsOH, 50% Solution

2513DX Cs₂CO₃, 99.9%

2514DX CsF, 99.9%

2515DX CsI, 99.99%

2516DX CsCOOH, 80% Solution

2518DX CsCl, 99.9%

2519DX Cs₂SO₄, 99.95%

2520DX Cs₂SO₄, 50% Solution

2810NH CuO, 99+%, 40nm

2910DX Dy₂O₃, 99.9+%, 50nm

3010DX Er₂O₃, 99.9%, 40-50nm

3011DX Er₂O₃, 99.9%, 10um

3013DX Er2O3, 99.9%, 1um

3015DX Er₂O₃, 99.5%, 200 mesh

3110DX Eu₂O₃, 99.99%, 50nm

3111DX Eu₂O₃, 99.9%, 2-3um

3310DX Fe₂O₃ alpha, 99%, 20-40nm

3315DX Fe₂O₃ gamma, 99%, 20-40nm

3320DX Fe₃O₄, 98+%, 20-30nm

3510CG Gd₂O₃, 99.9%, <100nm

3590DX Gd₂O₃, 99.9%

3810XX HfO₂, 99.9%, 100nm

3912DX Ho₂O₃, 99.9%

4110CB ITO, In₂O₃:SnO₂=90:10, 20-70nm, yellow

4111CB ITO, In₂O₃:SnO₂=95:5, 20-70nm, yellow

4112CB ITO, In₂O₃:SnO₂=90:10, 20-70nm, blue

4113CB ITO, In₂O₃:SnO₂=95:5, 20-70nm, blue

4115CB In₂O₃, 99.99%, 20-70nm

4116DX In₂O₃, 99.999%

4430DX LaB₆, 99.0%, 50-80nm

4410CG La₂O₃, 99.99%, 100nm

4411CG La₂O₃, 99.9%, 0.3-0.5 micron

4441CG La₂O₃, 99.9%
4460DX LaF₃, 99.5%
4712DX Lu₂O₃, 99.99%

4631HS LiCO2, 99.5%, ~5um

4632HS LiCO2, 99.5%, ~10um

4800DL MgO, 99.9%, 10-30nm

4810NH MgO, 99%, 20nm

4801DL MgO, 99.9%, 10-30nm, treated with Stearic Acid

4804DL MgO, 99.5%, <50um

4832SS Mg(OH)₂, 99.8%, 50nm

4910DX Mn₂O₃, 98+%, 40-60nm

4930DX MnO₂, 99+%, 5um

4950DX MnCl₂, 99+%, 5um

5010DX MoO₃, 99.5%, <100nm

5030CH MoCl₅, 99%

5220DX Nb₂O₅, 99.9%, 500nm

5221DX NbC, -100/+270 mesh
5310CG Nd₂O₃, 99.9%, <100nm
5311DX Nd₂O₃, 99.9%, 3-5um

5390DX NdF₃, 99.5%

5410SC NiO, 99.9%, 50nm

5911DX Pr₆O₁₁, 99.9%, 3-5um

5910DX Pr6O11, 99.9%, <100nm

5992DX PrF₃, 99.99%

6110DX Rb₂CO₃ 99.9%

6111DX RbNO₃ 99.9%
6112DX RbCl_, 99.9%

6113DX RbI 99.9%
6114DX RbF, 99.9%

6115DX RbOH 99.9%

6116DX Rb₂SO₄ 99.9%

6117DX Rb₃PO₄ 99.9%

6510SH S, 99.99%, <55nm

6610CY Sb₂O₃, 99.9%, 150nm

6807NM SiO₂, 99.5%, 15-20nm, porous

6808NM SiO₂, 99.5%, 20nm, non-porous

6809NM SiO₂, 98.7%, 10~20nm, non-porous

6811DL SiO2, 99%, 10-30nm, treated with Silane Coupling Agents

6851HN SiO₂, 10-20nm, modified with amino group, dispersible

6852HN SiO₂, 10-20nm, modified with epoxy group, dispersible

6853HN SiO₂, 10-20nm, modified with double bond, dispersible

6861HN SiO₂, 10-20nm, surface modified with double layer, dispersible

6862HN SiO₂, 10-20nm, surface modified, super-hydrophobic & oleophilic, dispersible

6863HN SiO₂, 99.8%, 5-15nm, surface modified, hydrophobic & oleophilic, dispersible

6864HN SiO₂, 99.8%, 10-25nm, surface modified, super-hydrophobic, dispersible

6820HK SiC, beta, 99%, 40nm

6880XH SiC, beta, whisker, 99+%

6830HK Si₃N₄, amorphous, 99%, 20nm

6835HM Si₃N₄, 99.5%, 0.5-1.0um

6835HK Si₃N₄ alpha, 97.5-99%, fiber, 100nmX800nm

6911DX Sm₂O₃, 99.9%,3-5 micron

6910DX Sm2O3, 99.9%, <100nm

7012LC SnO₂, 99.9%, 50-70nm

7012DX Sc₂O₃, 99.99%, 3-5um

7050NH ATO, SnO2:Sb2O3=90:10, 40nm

7191DX SrCO₃, 99.9%, <500nm

7340DX Ta₂O₅, 99.99%, <1 micron

7411DX Tb₄O₇, 99.9%, 3-5um

7511DX Tm₂O₃, 99.9%, 3-5um

7910DL TiO₂ anatase, 99.5%, 10-30 nm

7930DL TiO₂ anatase, 99.9%, 5 nm

7920SCDL TiO₂, Rutile, Silane Coated, 99.5%, 10~30nm

7918DL TiO₂ anatase + Rutile, 99.5%,10-30nm

7920DL TiO₂ Rutile, 99.5%, 10-30nm

7921DL TiO₂ Rutile coated with SiO2, 99%, 20~40nm

7940HK TiC, 99%, 40nm

7945HK TiN, 97+%, 20nm

8010CN WO₃, 99.5%, <100nm

8020CH WS₂, 99.9%, 0.8um

8005DX WC, 99.95%, 80nm

8170DX VC, 99+%, -100/+270mesh

8210CG Y₂O₃, 99.995%, 30-50nm

8211CG Y₂O₃, 99.995%, 0.5-1.0um

8212CG Y₂O₃, 99.995%, 1.0-2.0um

8223CG Y₂O₃, 99.999%, 3.0um

8290DX YF₃, 99.9%

8310DX YbF₃, 99.9%, 3-5um

8311DX Yb₂O₃, 99.9%, 3-5um

8410DL ZnO, 99.8%, <30nm

8411DL ZnO, 99%, 10-30nm, treated with silane coupling agents

8415CY ZnO, 99.8%, 200nm

8416DX ZnO, ultra high purity 99.999%

8418DX ZnO ( Al2O3 doped), 40nm

8501YS ZrO₂, 99.9%, 1-3um

8503DX ZrO2 in water, 2~5nm

8512QI ZrO₂, 99.9%, 20-30nm

8520DL ZrO₂-3Y, 99.9%, 0.3-0.5um

8522QI ZrO₂- 3Y, 25nm

8528QI ZrO₂- 5Y, 20-30nm

8531DL ZrO₂- 8Y, 0.8um

8532QI ZrO₂- 8Y, 20nm

8540HK ZrC, 97+%, 60nm

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